ZEISS Trademark — Accepted & Advertised Status & Details

The current status of ZEISS is "Accepted & Advertised". It was filed on 25/09/2024 at IR DIVISION in Class N/A. Status may change over time as the application moves through examination, publication, opposition and registration stages.

ZEISS is filed in Class N/A, covering: Micro-lithography equipment; machines for use in the manufacture by micro-lithography, especially in the manufacture of electronic components, integrated circuits, semi-conductors; universal fixtures and clamping devices used with dimensional measuring apparatus and instruments (term considered too vague by the International Bureau pursuant to Rule 13 (2) (b) of the Regulations); parts, fittings and components for all the aforesaid goods. Optical apparatus and instruments; semiconductor lenses; apparatus and software for metrology (term considered too vague by the International Bureau pursuant to Rule 13 (2) (b) of the Regulations); electric, electronic and optical apparatus and instruments for use in the manufacture by microlithography, especially of electronic components, semi-conductors, integrated circuits (term considered too vague by the International Bureau pursuant to Rule 13 (2) (b) of the Regulations); electric, electronic and optical apparatus and instruments for use in microlithography (term considered too vague by the International Bureau pursuant to Rule 13 (2) (b) of the Regulations); software for use in the electronics, micro-lithography, semi-conductor, integrated circuit and integrated optical systems industries; software for the design, testing and fabrication of photo-lithographic masks; semi-conductors; integrated circuits; photo-lithographic masks (term considered too vague by the International Bureau pursuant to Rule 13 (2) (b) of the Regulations); laser light sources for use in semiconductor manufacturing (term considered too vague by the International Bureau pursuant to Rule 13 (2) (b) of the Regulations); electronic imaging platforms in the field of inspection of semiconductor materials, namely, semiconductor wafers and reticles (term considered too vague by the International Bureau pursuant to Rule 13 (2) (b) of the Regulations); electron beam inspection apparatus using scanning method; parts, fittings and components for all the aforesaid goods. Maintenance and repair services in connection with machines, apparatus and instruments for use in the electronics, micro-lithography, semi-conductor, integrated circuit, magnetic domain memories and integrated optical systems industries. Education and training in connection with the electronics, micro-lithography, semi-conductor, integrated circuit, magnetic domain memories and integrated optical systems industries; education and training in connection with the use of software in the micro-lithography, semiconductor, integrated circuit, magnetic domain memories and integrated optical systems industries; advisory and consultancy services in connection with the aforesaid services. Technical advisory and consultancy services in connection with machines, apparatus and instruments for use in the electronics, micro-lithography, semi-conductor, integrated circuit, magnetic domain memories and integrated optical systems industries (term considered too vague by the International Bureau pursuant to Rule 13 (2) (b) of the Regulations); design, maintenance and development of computer software for use in the electronics, micro-lithography, semi-conductor, integrated circuit, magnetic domain memories and integrated optical systems industries and for the design, testing and fabrication of photo-lithographic masks; advisory and consultancy services in connection with the aforesaid services.

ZEISS covers: Micro-lithography equipment; machines for use in the manufacture by micro-lithography, especially in the manufacture of electronic components, integrated circuits, semi-conductors; universal fixtures and clamping devices used with dimensional measuring apparatus and instruments (term considered too vague by the International Bureau pursuant to Rule 13 (2) (b) of the Regulations); parts, fittings and components for all the aforesaid goods. Optical apparatus and instruments; semiconductor lenses; apparatus and software for metrology (term considered too vague by the International Bureau pursuant to Rule 13 (2) (b) of the Regulations); electric, electronic and optical apparatus and instruments for use in the manufacture by microlithography, especially of electronic components, semi-conductors, integrated circuits (term considered too vague by the International Bureau pursuant to Rule 13 (2) (b) of the Regulations); electric, electronic and optical apparatus and instruments for use in microlithography (term considered too vague by the International Bureau pursuant to Rule 13 (2) (b) of the Regulations); software for use in the electronics, micro-lithography, semi-conductor, integrated circuit and integrated optical systems industries; software for the design, testing and fabrication of photo-lithographic masks; semi-conductors; integrated circuits; photo-lithographic masks (term considered too vague by the International Bureau pursuant to Rule 13 (2) (b) of the Regulations); laser light sources for use in semiconductor manufacturing (term considered too vague by the International Bureau pursuant to Rule 13 (2) (b) of the Regulations); electronic imaging platforms in the field of inspection of semiconductor materials, namely, semiconductor wafers and reticles (term considered too vague by the International Bureau pursuant to Rule 13 (2) (b) of the Regulations); electron beam inspection apparatus using scanning method; parts, fittings and components for all the aforesaid goods. Maintenance and repair services in connection with machines, apparatus and instruments for use in the electronics, micro-lithography, semi-conductor, integrated circuit, magnetic domain memories and integrated optical systems industries. Education and training in connection with the electronics, micro-lithography, semi-conductor, integrated circuit, magnetic domain memories and integrated optical systems industries; education and training in connection with the use of software in the micro-lithography, semiconductor, integrated circuit, magnetic domain memories and integrated optical systems industries; advisory and consultancy services in connection with the aforesaid services. Technical advisory and consultancy services in connection with machines, apparatus and instruments for use in the electronics, micro-lithography, semi-conductor, integrated circuit, magnetic domain memories and integrated optical systems industries (term considered too vague by the International Bureau pursuant to Rule 13 (2) (b) of the Regulations); design, maintenance and development of computer software for use in the electronics, micro-lithography, semi-conductor, integrated circuit, magnetic domain memories and integrated optical systems industries and for the design, testing and fabrication of photo-lithographic masks; advisory and consultancy services in connection with the aforesaid services.

The exact word "ZEISS" is already on record at the Indian Trademark Registry under Application No. 6970779. If you intend to use a similar mark for similar goods or services, you should conduct a comprehensive availability search and consult a trademark attorney before filing. Registerkaro offers a free availability check followed by professional filing.

Indian registered trademarks are valid for 10 years from the date of registration and can be renewed indefinitely in 10-year blocks. ZEISS (App #6970779) is currently in status "Accepted & Advertised" — renewal dates apply only after registration is granted.

If ZEISS is in the "Advertised before Acceptance" or "Accepted & Advertised" stage, you have a 4-month window from publication in the Trade Marks Journal to file an opposition (Form TM-O) at the same Trade Marks Registry office. Grounds typically include prior rights, descriptiveness or bad faith. Registerkaro can prepare and file a Notice of Opposition for you.